Numerical simulation of low pressure chemical vapor deposition of Cu on SiO2 using CuI as precursor

Möller, A.; Kall, R.; Till, V.; Wortberg, Gerd; Adomeit, Gerhard

(1997)
Beitrag zu einem Tagungsband

In: Modelling of Chemical Reaction Systems, Heidelberg, 24.-26.7.1997